Nitrogen trifluoride (NF3) is a colorless, odorless and stable gas at normal temperature and a strong oxidant. Nitrogen trifluoride is an excellent plasma etching gas in the microelectronics industry. It is cracked into active fluorine ions during ion etching. These fluorine ions have excellent etching rate and selectivity (for silicon oxide and silicon) for silicon and tungsten compounds. It does not leave any residue on the surface of the etched object during etching. It is a very good cleaning agent. At the same time, it is used in chip manufacturing High energy lasers have been widely used.

Electronic grade nitrogen trifluoride gas is a new type of electronic chemical developed in recent years, mainly used for plasma etching and cleaning of electronic components. When nitrogen trifluoride is used for etching silicon and silicon nitride, it has higher etching rate and selectivity, and no substance remains on the surface of the etched object.

Main uses of nitrogen trifluoride:
1、 Used as fluorine source of high-energy chemical laser gas.
2、 As an etchant and a cleaning agent in the electronic industry (IC).
3、 Applied to the solar photovoltaic industry.
Other uses of NF3: produce perfluoroammonium salt, use as filling gas to increase the life and brightness of bulbs, and use as oxidant in mining and rocket technology.