Nitrogen Trifluoride (NF3) 4N Grade

Nitrogen trifluoride (NF3) is a colorless, odorless, stable gas at room temperature and a strong oxidant. Nitrogen trifluoride is used as an excellent plasma etching gas in the microelectronic industry. It is cracked into active fluorine ions during ion etching. These fluorine ions have excellent etching rates and selectivity for silicon and tungsten compounds, and high-purity nitrogen trifluoride.(for silicon oxide and silicon), it does not leave any residue on the surface of the etched material during etching. It is a very good cleaning agent, and is also widely used in chip manufacturing and high-energy lasers.

Electronic grade nitrogen trifluoride gas is a new type of electronic chemical developed in recent years and is mainly used for plasma etching and cleaning of electronic components. When nitrogen trifluoride is used for etching silicon and silicon nitride, it has a higher etching rate and selectivity, and no matter remains on the surface of the etched object.

Main uses of nitrogen trifluoride:
1. Used as a fluorine source for high-energy chemical laser gas.
2. As an etchant and cleaning agent in the electronics industry (IC).
3. Applied to the solar photovoltaic industry.
Other uses of NF3: produce perfluoroammonium salts, use as filling gases to increase lamp life and brightness, use as oxidants in mining and rocket technology, etc.